Chengdu, China

Xun Ma

This inventor holds 1 USPTO granted patent. Top assignee: Disney Enterprises, Inc.. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Xun Ma. Retrieved from https://idiyas.com/inventor/xun-ma-3qoglb5e

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 9.0

ph-index = 1


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Xun Ma: Innovator in User Interaction Technology

Introduction

Xun Ma is a notable inventor based in Chengdu, China. He has made significant contributions to the field of user interaction through his innovative patent. His work focuses on enhancing user engagement with computing platforms.

Latest Patents

Xun Ma holds a patent titled "Eliciting user interaction with a stimulus through a computing platform." This patent describes a method of presenting a user with a stimulus to encourage interaction with a task on a computing platform. The stimulus is activated when specific triggering criteria are met, prompting the user to complete a designated task. The task includes a set of criteria that must be satisfied for completion. Users are continuously prompted by the stimulus until they meet the task criteria, at which point they are presented with options to modify the stimulus.

Career Highlights

Xun Ma is currently employed at Disney Enterprises, Inc., where he applies his expertise in user interaction technology. His innovative approach has the potential to transform how users engage with digital platforms.

Collaborations

Xun Ma collaborates with talented individuals such as Jian Fei Ouyang and Mei Shan Zhou. Their combined efforts contribute to advancing technology in user interaction.

Conclusion

Xun Ma's work exemplifies the importance of innovation in enhancing user experiences on computing platforms. His patent reflects a forward-thinking approach to user engagement that could shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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