Hong Kong, China

Xuejie Shi


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: The Innovations of Xuejie Shi in Silicon Thin Films

Introduction: Xuejie Shi is a prominent inventor based in Hong Kong, CN. He has made significant contributions to the field of materials science, particularly in the development of silicon thin films. His innovative work has led to advancements in the production of thin film transistors, which are essential components in modern electronic devices.

Latest Patents: Xuejie Shi holds a patent titled "Metal-induced crystallization of amorphous silicon, polycrystalline silicon thin films produced thereby and thin film transistors produced therefrom." This patent describes a process where crystallization-inducing metal elements are introduced onto an amorphous silicon thin film. A first, low-temperature heat treatment induces nucleation of metal-induced crystallization (MIC), resulting in the formation of small polycrystalline silicon 'islands.' A metal-gettering layer is formed on the resulting partially crystallized thin film. A second, low-temperature heat treatment completes the MIC process while gettering metal elements from the partially crystallized thin film. This innovative process results in the desired polycrystalline silicon thin film.

Career Highlights: Xuejie Shi is affiliated with The Hong Kong University of Science and Technology, where he continues to engage in cutting-edge research. His work has garnered attention for its potential applications in the electronics industry, particularly in enhancing the performance of thin film transistors.

Collaborations: Xuejie Shi has collaborated with notable colleagues, including Man Chit Wong and Hoi-Sing Kwok. These collaborations have further enriched his research and contributed to the advancement of technology in the field.

Conclusion: Xuejie Shi's innovative contributions to the field of silicon thin films and his patent on metal-induced crystallization highlight his role as a leading inventor in materials science. His work continues to influence the development of advanced electronic components, showcasing the importance of innovation in technology.

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