Munich, Germany

Xue Wang

This inventor holds 1 USPTO granted patent. Top assignee: Technische Universitat Braunschweig. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Xue Wang. Retrieved from https://idiyas.com/inventor/xue-wang-79tg2ayc

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Innovations by Xue Wang in Semiconductor Manufacturing

Introduction

Xue Wang is a notable inventor based in Munich, Germany. She has made significant contributions to the field of semiconductor manufacturing. Her innovative methods have the potential to enhance the efficiency and effectiveness of semiconductor elements.

Latest Patents

Xue Wang holds a patent for a "Method of manufacturing of a semi-conductor element and semi-conductor element." This patent describes a method that includes several steps, such as providing a substrate with a surface that is partially coated and has at least one uncoated area. The method involves growing a truncated pyramid of gallium nitride on the uncoated area, followed by the growth of at least one gallium nitride column on the truncated pyramid. This innovative approach could lead to advancements in semiconductor technology.

Career Highlights

Xue Wang is currently associated with Technische Universität Braunschweig, where she continues her research and development in semiconductor technologies. Her work is recognized for its potential impact on the industry, particularly in improving the manufacturing processes of semiconductor elements.

Collaborations

Xue Wang collaborates with esteemed colleagues such as Andreas Waag and Shunfeng Li. Their combined expertise contributes to the advancement of semiconductor research and innovation.

Conclusion

Xue Wang's contributions to semiconductor manufacturing through her innovative patent demonstrate her significant role in the field. Her work continues to inspire advancements in technology and research.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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