Beijing, China

Xuanyu Bai

This inventor holds 1 USPTO granted patent. Top assignee: Microsoft Technology Licensing, LLC. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Xuanyu Bai. Retrieved from https://idiyas.com/inventor/xuanyu-bai

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Xuanyu Bai - Innovator in Multi-Model Joint Denoising Training

Introduction

Xuanyu Bai is a prominent inventor based in Beijing, China. He has made significant contributions to the field of denoising training through his innovative methods and apparatus. His work is particularly relevant in the context of improving the quality of training samples in various applications.

Latest Patents

Xuanyu Bai holds a patent for a method titled "Multi-model joint denoising training." This patent proposes a novel approach where multiple models are utilized to denoise a set of training samples. The process involves training these models with the denoised samples, thereby enhancing the overall effectiveness of the training methodology. He has 1 patent to his name.

Career Highlights

Xuanyu Bai is currently associated with Microsoft Technology Licensing, LLC, where he continues to develop and refine his innovative ideas. His work at Microsoft has allowed him to collaborate with leading experts in the field, further advancing his research and contributions.

Collaborations

Some of his notable coworkers include Linjun Shou and Ming Gong. Their collaboration has fostered a productive environment for innovation and development in their respective fields.

Conclusion

Xuanyu Bai's contributions to multi-model joint denoising training exemplify the impact of innovative thinking in technology. His work not only enhances the quality of training samples but also sets a foundation for future advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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