Company Filing History:
Years Active: 2015-2019
Title: Xuanming Duan: Innovator in Photolithography and Laser Processing
Introduction
Xuanming Duan is a prominent inventor based in Beijing, China. He has made significant contributions to the fields of photolithography and laser processing. With a total of 3 patents to his name, Duan continues to push the boundaries of technology and innovation.
Latest Patents
Duan's latest patents include a "Maskless Photolithographic System in Cooperative Working Mode for Cross-Scale Structure." This innovative system features a laser point-by-point scanning exposure unit and a plane-projection exposure unit. It allows for precise exposure of patterns based on predetermined thresholds. Another notable patent is the "Laser Micro/Nano Processing System and Method." This system utilizes two laser beams with different wavelengths to achieve higher processing resolution while maintaining lower average power.
Career Highlights
Xuanming Duan is affiliated with the Chinese Academy of Sciences, where he conducts research and development in advanced laser technologies. His work has garnered attention for its potential applications in various industries, including electronics and materials science.
Collaborations
Duan collaborates with esteemed colleagues such as Xianzi Dong and Shu Kai Chen. Their combined expertise enhances the innovative capabilities of their projects.
Conclusion
Xuanming Duan is a leading figure in the realm of photolithography and laser processing. His patents reflect a commitment to advancing technology and innovation.