Shandong, China

Xiumei Qi

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Weihai Hualing Opto-Electronics Co., Ltd. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Xiumei Qi. Retrieved from https://idiyas.com/inventor/xiumei-qi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Innovations by Xiumei Qi in Paper Thickness Detection

Introduction

Xiumei Qi is an accomplished inventor based in Shandong, China. He has made significant contributions to the field of paper thickness detection through his innovative methods and apparatus. His work is particularly relevant in industries where precise paper measurements are crucial.

Latest Patents

Xiumei Qi holds a patent for a "Method and apparatus for detecting thickness of paper and storage medium." This invention provides a systematic approach to measuring the thickness of paper. The method involves acquiring a first thickness image of the target paper and extracting various thickness features from this image. By processing the gray values of multiple pixel points, the invention determines changes in thickness, enhancing the accuracy of paper measurement.

Career Highlights

Xiumei Qi is associated with Weihai Hualing Opto-electronics Co., Ltd., where he applies his expertise in optical electronics. His innovative approach has positioned him as a key figure in the development of advanced measurement technologies.

Collaborations

Xiumei Qi collaborates with talented individuals such as Li Jiang and Rongxin Song, who contribute to his projects and enhance the overall innovation process.

Conclusion

Xiumei Qi's contributions to the field of paper thickness detection exemplify the importance of innovation in technology. His patent reflects a significant advancement that can benefit various industries reliant on precise paper measurements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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