Xiuhua Zhang

Title: Innovations by Xiuhua Zhang in Semiconductor Processing

Introduction

Xiuhua Zhang is a notable inventor based in San Jose, California, recognized for his contributions to semiconductor processing technologies. With a total of 4 patents, Zhang has made significant advancements in the field, particularly in chemical mechanical planarization (CMP) systems.

Latest Patents

Zhang's latest patents include a "Chemical mechanical planarization (CMP) system and method for preparing a wafer in a cleaning module." This patent describes a method where slurry is dispensed onto a wafer's surface, followed by a CMP operation that involves a brush contacting the wafer's surface. A subsequent cleaning operation is also conducted within the cleaning module. Another significant patent is the "Cleaning/buffer apparatus for use in a wafer processing device." This invention outlines a semiconductor processing system designed for buffing or scrubbing both sides of a wafer simultaneously, incorporating a processing box for chemical solutions and a positioning device for semiconductor substrates.

Career Highlights

Throughout his career, Xiuhua Zhang has worked with prominent companies in the semiconductor industry, including Lam Research Corporation and Ontrak Systems, Inc. His experience in these organizations has contributed to his expertise and innovative capabilities in wafer processing technologies.

Collaborations

Zhang has collaborated with various professionals in the field, including Diane J. Hymes and Michael Ravkin. These collaborations have likely enriched his work and led to further advancements in semiconductor processing.

Conclusion

Xiuhua Zhang's innovative work in semiconductor processing, particularly in CMP systems, showcases his significant contributions to the industry. His patents reflect a commitment to enhancing wafer preparation and cleaning processes, marking him as a key figure in the field.