Company Filing History:
Years Active: 2010-2014
Title: Xinya Lei: Innovator in Photolithography Technologies
Introduction
Xinya Lei is a prominent inventor based in Boise, ID (US), known for his contributions to the field of photolithography. With a total of 7 patents to his name, he has made significant advancements in optical technologies that enhance device manufacturing processes.
Latest Patents
Among his latest patents, Xinya Lei has developed methods and systems for reduced lens heating. One embodiment of this invention includes a system featuring an illuminator that produces light waves of a specific wavelength, along with a mask that contains both opaque areas and openings. These openings incorporate slanted, sub-resolution features that help redistribute light to off-axis locations. Additionally, he has worked on optical compensation devices, which involve photolithographic apparatus and systems that utilize optically transmissive substrates. These devices are designed to alter the phase of illumination radiation, thereby improving the efficiency of imaging masks.
Career Highlights
Xinya Lei is currently employed at Micron Technology Incorporated, where he continues to innovate and develop cutting-edge technologies. His work has been instrumental in advancing the capabilities of photolithography, which is crucial for the production of semiconductor devices.
Collaborations
Xinya has collaborated with notable colleagues, including Fei Wang and Pary Baluswamy, who contribute to the dynamic research environment at Micron Technology.
Conclusion
Xinya Lei's innovative work in photolithography and optical technologies has positioned him as a key figure in the industry. His patents reflect a commitment to enhancing manufacturing processes and improving device performance.