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For the Inventor, By the Inventor

Boise, ID, United States of America

Xinya Lei

This inventor holds 7 USPTO granted patents. Top assignee: Micron Technology Incorporated. Active years: 2010-2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Xinya Lei. Retrieved from https://idiyas.com/inventor/xinya-lei

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 7

% Patents Active = 85.7

Average Co-Inventor Count = 2.3

ph-index = 2

Forward Citations = 9(Granted Patents)


Company Filing History:

goldMedal7 out of 39,176 
 
Micron Technology Incorporated
 patents

Years Active: 2010-2014

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7 patents (USPTO):Explore Patents
1. 8916314 - Reduced lens heating methods, apparatus, and systems (2014-12-23),
2. 8323859 - Optical compensation devices, systems, and methods (2012-12-04),
3. 8173333 - Reduced lens heating methods, apparatus, and systems (2012-05-08),
4. 8062814 - Optical compensation devices, systems, and methods (2011-11-22),
5. 7947412 - Reduced lens heating methods, apparatus, and systems (2011-05-24),
6. 7864294 - Focus sensitive lithographic apparatus, systems, and methods (2011-01-04),
7. 7790338 - Optical compensation devices, systems, and methods (2010-09-07),

Title: Xinya Lei: Innovator in Photolithography Technologies

Introduction

Xinya Lei is a prominent inventor based in Boise, ID (US), known for his contributions to the field of photolithography. With a total of 7 patents to his name, he has made significant advancements in optical technologies that enhance device manufacturing processes.

Latest Patents

Among his latest patents, Xinya Lei has developed methods and systems for reduced lens heating. One embodiment of this invention includes a system featuring an illuminator that produces light waves of a specific wavelength, along with a mask that contains both opaque areas and openings. These openings incorporate slanted, sub-resolution features that help redistribute light to off-axis locations. Additionally, he has worked on optical compensation devices, which involve photolithographic apparatus and systems that utilize optically transmissive substrates. These devices are designed to alter the phase of illumination radiation, thereby improving the efficiency of imaging masks.

Career Highlights

Xinya Lei is currently employed at Micron Technology Incorporated, where he continues to innovate and develop cutting-edge technologies. His work has been instrumental in advancing the capabilities of photolithography, which is crucial for the production of semiconductor devices.

Collaborations

Xinya has collaborated with notable colleagues, including Fei Wang and Pary Baluswamy, who contribute to the dynamic research environment at Micron Technology.

Conclusion

Xinya Lei's innovative work in photolithography and optical technologies has positioned him as a key figure in the industry. His patents reflect a commitment to enhancing manufacturing processes and improving device performance.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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