Xingyuan Zhang

Title: Innovations by Xingyuan Zhang: A Pioneer in Nanoimprint Lithography

Introduction: Xingyuan Zhang, an accomplished inventor based in Shandong, China, has made a significant impact in the field of nanoimprint lithography. With a noteworthy patent to his name, Zhang's contributions reflect his innovative spirit and dedication to advancing technology.

Latest Patents: Zhang holds a patent titled "Mold with cavities for nanoimprint lithography and method of imprinting same." This invention involves a one-piece mold structure comprising an upper and a lower mold that are welded together. The upper mold features multiple stepped holes, while the lower mold is equipped with grooves that connect to external high-pressure water and vacuum pumps. This innovative design includes an airtight cavity that utilizes negative pressure during the imprint process, enhancing the efficiency and effectiveness of the technology. The demolding process cleverly employs water pressure to create a crack at the interface between the mold and the imprint resist, facilitating the removal of the imprinted structure.

Career Highlights: Xingyuan Zhang is affiliated with the Shandong University of Science and Technology, where he contributes to the development of cutting-edge technologies. His expertise and research focus on nanoimprint lithography, positioning him as a key player in this innovative field.

Collaborations: Zhang collaborates with esteemed colleagues, including Qing Wang and Jintao Zhang. Together, they work on advancing research and expanding the horizons of innovation within their domain.

Conclusion: Xingyuan Zhang's inventive work in nanoimprint lithography exemplifies the transformative power of innovation in technology. His patent not only showcases his technical prowess but also contributes to the broader advancement of materials science and engineering. As the field continues to evolve, Zhang's contributions will undoubtedly play a crucial role in shaping future developments.