This inventor holds 3 USPTO granted patents. Top assignees: Agere Systems Inc., Agere Systems Guardian Corp.. Active years: 2002-2003.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2002-2003
Title: Xieqing Zhu: Innovator in Electron Beam Lithography
Introduction
Xieqing Zhu is a prominent inventor based in London, GB. He has made significant contributions to the field of electron beam lithography, holding a total of 3 patents. His work focuses on enhancing the precision and effectiveness of electron patterning tools.
Latest Patents
Xieqing Zhu's latest patents include innovative apparatuses and methods for electron beam lithography. One of his notable inventions is the "Electron beam lithography apparatus focused through spherical aberration introduction." This apparatus features a source for producing an electron beam, a mask, and a projection column, through which the electron beam passes. The wafer is positioned in a plane where spherical aberrations of the projection column mitigate the negative defocusing effects caused by chromatic aberrations. This technology is applicable to various electron patterning tools, including the SCALPEL™ electron patterning tool.
Another significant patent is the "Electron beam lithography focusing through spherical aberration introduction," which shares similar features and applications as the previous invention. These advancements are crucial for improving the accuracy and efficiency of electron beam lithography processes.
Career Highlights
Throughout his career, Xieqing Zhu has worked with notable companies such as Agere Systems Inc. and Agere Systems Guardian Corporation. His experience in these organizations has contributed to his expertise in electron beam technology and innovation.
Collaborations
Xieqing Zhu has collaborated with talented individuals in his field, including Victor Katsap and Eric Munro. These partnerships have fostered a collaborative environment that encourages innovation and the development of cutting-edge technologies.
Conclusion
Xieqing Zhu's contributions to electron beam lithography demonstrate his commitment to advancing technology in this specialized field. His patents reflect a deep understanding of the challenges in electron patterning and offer solutions that enhance precision and efficiency.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile