Company Filing History:
Years Active: 2016
Title: Innovations of Xiaoyan Bao in Semiconductor Technology
Introduction
Xiaoyan Bao is a prominent inventor based in Shanghai, China, known for his contributions to semiconductor technology. With a focus on innovative methods for fabricating semiconductor devices, Bao has made significant strides in the field.
Latest Patents
Xiaoyan Bao holds 1 patent for a semiconductor device and its fabrication method. This patent outlines a comprehensive method for forming a semiconductor device, which includes several key steps. The process begins with providing a substrate that has distinct first and second regions. A first dielectric layer is formed on the substrate, followed by a second dielectric layer that features multiple first openings. These openings expose portions of the top surface of the first dielectric layer. A first conductive layer is then created within these openings. The second dielectric layer and the first dielectric layer are etched in the second region until the substrate is exposed, resulting in the formation of multiple second openings. Passivation regions are established in the substrate portions exposed by these openings. The surface of the first dielectric layer in the second region is then exposed, and a third dielectric layer is formed on this surface and within the second openings. Finally, a second conductive layer is created over the third dielectric layer, with a portion configured as an inductor.
Career Highlights
Xiaoyan Bao has worked with notable companies in the semiconductor industry, including Semiconductor Manufacturing International Corporation and Semiconductor Manufacturing International Corp. His experience in these organizations has contributed to his expertise in semiconductor device fabrication.
Collaborations
Xiaoyan Bao has collaborated with various professionals in his field, including his coworker, Hongtao Ge, who is also a talented woman in the semiconductor industry.
Conclusion
Xiaoyan Bao's innovative work in semiconductor technology showcases his commitment to advancing the field through his patented methods. His contributions are significant in shaping the future of semiconductor devices.