Xiaoxiang Sun

Title: Innovations of Xiaoxiang Sun in Semiconductor Manufacturing

Introduction

Xiaoxiang Sun is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor manufacturing. His innovative approaches have led to advancements that enhance the efficiency and effectiveness of semiconductor production.

Latest Patents

Xiaoxiang Sun holds a patent for a trench gate manufacturing method. This method includes several steps: forming a trench in the surface of a semiconductor substrate, creating a first oxide layer, selecting a coating based on the trench's depth-to-width ratio, and etching back the coating through a dry etching process. The process continues with wet etching on the first oxide layer, removing the coating, and finally growing a gate oxide. This method allows for the realization of a BTO at a low cost and is suitable for forming BTOs in trenches with various depth-to-width ratios, thus expanding its application range.

Career Highlights

Xiaoxiang Sun is associated with Shanghai Huahong Grace Semiconductor Manufacturing Corporation, where he applies his expertise in semiconductor technologies. His work has been instrumental in developing methods that improve manufacturing processes and product quality.

Collaborations

Xiaoxiang collaborates with talented colleagues, including Jiye Yang and Tao Wang. Their combined efforts contribute to the innovative environment at their workplace.

Conclusion

Xiaoxiang Sun's contributions to semiconductor manufacturing through his patented trench gate manufacturing method exemplify his innovative spirit and dedication to advancing technology. His work continues to influence the industry positively.