Shanghai, China

Xiaoxia Fu

USPTO Granted Patents = 1 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2024

Loading Chart...
1 patent (USPTO):Explore Patents

Title: The Innovative Journey of Xiaoxia Fu in Fault Handling Technology

Introduction: Xiaoxia Fu is an accomplished inventor based in Shanghai, China, known for his significant contributions to the field of technology. His innovative work in fault handling mechanisms has led to the development of a crucial patent that enhances device connectivity and reliability.

Latest Patents: Xiaoxia Fu holds one notable patent titled "Mechanism of enabling fault handling with PCIE re-timer." This invention pertains to an extension device positioned within a point-to-point link connecting two devices. The device boasts error detection circuitry capable of identifying a variety of errors. Additionally, it features memory for storing an event register, allowing it to log data related to detected errors. The extension device is designed to transmit a notification signal whenever it detects an error, alongside data present in the event register concerning the issue. This inventive mechanism plays a vital role in improving the performance and stability of digital communication systems.

Career Highlights: Xiaoxia Fu is currently employed at Intel Corporation, where he contributes to cutting-edge technology development. His work is instrumental in advancing the capabilities of PCIE (Peripheral Component Interconnect Express) systems, enhancing their efficiency and reliability.

Collaborations: Throughout his career, Xiaoxia Fu has collaborated with several notable colleagues, including Haifeng Gong and Manisha M Nilange. These collaborative efforts reflect the teamwork and collective expertise that drive innovation at Intel Corporation, fostering a progressive environment for technological advancements.

Conclusion: Xiaoxia Fu stands out as a prolific inventor whose work on fault handling mechanisms through innovative technologies significantly impacts connectivity in modern devices. As technology continues to evolve, contributions like those from Fu not only enhance device performance but also pave the way for future innovations in engineering and technology.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…