Xiaoping Shi

Title: Innovations of Xiaoping Shi in Semiconductor Technology

Introduction

Xiaoping Shi is a notable inventor based in Beijing, China. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique patent that enhances the efficiency of semiconductor manufacturing processes.

Latest Patents

Xiaoping Shi holds a patent for a pattern sheet, semiconductor intermediate product, and hole etching method. This patent discloses a pattern sheet that includes a substrate, a dielectric layer, and a mask structure. The mask structure consists of a multi-layer mask layer, with the uppermost layer being a photoresist layer. The design ensures that the thickness of each layer and the etching selectivity ratios between the layers below the mask layer are optimized. This innovation allows for the etching of a through-hole that penetrates the thickness of the lower layer of the mask layer, while maintaining a remaining thickness of the upper layer that is greater than or equal to zero.

Career Highlights

Xiaoping Shi is currently employed at Beijing Naura Microelectronics Equipment Co., Ltd. His work at this company has positioned him as a key player in advancing semiconductor technologies. His expertise and innovative mindset have contributed to the company's reputation in the industry.

Collaborations

Xiaoping has collaborated with several talented individuals in his field, including Qiushi Xie and Qingjun Zhou. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Xiaoping Shi's contributions to semiconductor technology through his innovative patent demonstrate his commitment to advancing the field. His work at Beijing Naura Microelectronics Equipment Co., Ltd. and collaborations with other professionals highlight the importance of teamwork in driving innovation.