Beijing, China

Xiaomei Lu

This inventor holds 1 USPTO granted patent. Top assignee: Ricoh Company, Ltd.. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Xiaomei Lu. Retrieved from https://idiyas.com/inventor/xiaomei-lu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Innovations by Xiaomei Lu in Distance Estimation Technology

Introduction

Xiaomei Lu is a prominent inventor based in Beijing, China. She has made significant contributions to the field of distance estimation technology. Her innovative work has led to the development of a unique method and device for estimating distances between nodes.

Latest Patents

Xiaomei Lu holds 1 patent for her invention titled "Distance estimation method and device as well as node localization method and apparatus." This patent discloses a method for estimating the distance between two nodes. The method involves obtaining an original real-time strength sequence, which consists of signal strengths between the two nodes over a specified time period. It further includes conducting a multi-scale transform on the original sequence to acquire multiple real-time strength component sequences. The process also involves removing burst noise elements and estimating a real-time distance based on updated strength component sequences.

Career Highlights

Xiaomei Lu is currently employed at Ricoh Company, Ltd., where she continues to innovate and develop new technologies. Her work has been instrumental in advancing the capabilities of distance estimation methods.

Collaborations

Xiaomei collaborates with talented coworkers, including Bin Da and Wei Wang, who contribute to her projects and research efforts.

Conclusion

Xiaomei Lu's contributions to distance estimation technology exemplify her innovative spirit and dedication to advancing the field. Her patent reflects her expertise and commitment to developing practical solutions for real-world applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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