Shaanxi, China

Xiaolong Chen

This inventor holds 1 USPTO granted patent. Top assignee: Xi'an Jiaotong University. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Xiaolong Chen. Retrieved from https://idiyas.com/inventor/xiaolong-chen-mp7dhb70

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Innovations of Xiaolong Chen in Vacuum Technology

Introduction

Xiaolong Chen is a notable inventor based in Shaanxi, China. He has made significant contributions to the field of vacuum technology, particularly with his innovative designs and systems. His work is characterized by a focus on enhancing the efficiency and reliability of vacuum arc extinguishing chambers.

Latest Patents

Xiaolong Chen holds a patent for a "Vacuum degree detection device, monitoring system, and vacuum arc extinguishing chamber thereof." This invention includes a ceramic insulating housing that is sealingly fixed to an end face cover plate of the vacuum arc-extinguishing chamber. The design features a thermoelectric vacuum sensor that detects the vacuum degree within the chamber, ensuring optimal performance and safety.

Career Highlights

Xiaolong Chen is affiliated with Xi'an Jiaotong University, where he engages in research and development in the field of electrical engineering. His academic background and practical experience have positioned him as a key figure in advancing vacuum technology.

Collaborations

Xiaolong Chen has worked alongside talented colleagues such as Yi Wu and Hailong He. Their collaborative efforts have contributed to the successful development of innovative technologies in their field.

Conclusion

Xiaolong Chen's contributions to vacuum technology exemplify the importance of innovation in engineering. His patent and ongoing research continue to influence advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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