This inventor holds 4 USPTO granted patents. Top assignees: 3M Innovative Properties Company, Polaroid Corporation. Active years: 1999-2004.
Company Filing History:
Years Active: 1999-2004
Title: The Innovative Contributions of Xiaojia Z Wang
Introduction
Xiaojia Z Wang is a notable inventor based in Acton, MA (US). He has made significant contributions to the field of optics, particularly in the development of antireflection films. With a total of 4 patents to his name, Wang's work has had a considerable impact on various industries.
Latest Patents
Wang's latest patents focus on antireflection coatings that comprise one or more inorganic antireflection layers, typically made of metal oxide or silica, combined with a polymer layer cured in situ. This polymer layer has a refractive index not greater than about 1.53 over the wavelength range of 400 to 700 nm and a thickness ranging from about 20 to about 200 nm. The polymer layer not only provides excellent scratch and fingerprint protection but also allows for the reduction of the thickness of the inorganic antireflection layers, thereby decreasing the overall cost of the coating.
Career Highlights
Throughout his career, Xiaojia Z Wang has worked with prominent companies such as Polaroid Corporation and 3M Innovative Properties Company. His experience in these organizations has contributed to his expertise in the field of optical coatings and materials.
Collaborations
Wang has collaborated with several professionals in his field, including Shawn P Lambert and Hyung-Chul Choi. These collaborations have further enhanced his innovative capabilities and contributions to the industry.
Conclusion
Xiaojia Z Wang's work in developing advanced antireflection films showcases his innovative spirit and dedication to improving optical technologies. His contributions continue to influence the industry and pave the way for future advancements.