Xiaohu Zheng

Title: Innovations of Xiaohu Zheng in Graphene Technology

Introduction

Xiaohu Zheng is a prominent inventor based in Shanghai, China, known for his contributions to graphene technology. With a total of 2 patents, Zheng has made significant strides in the field, particularly in the development of advanced materials and devices.

Latest Patents

Zheng's latest patents include a "Graphene structure having graphene bubbles and preparation method for the same." This invention provides a method for creating a graphene structure with bubbles, which involves forming a hydrogen-terminated layer on a substrate and applying a voltage to create bulges in the graphene layer. Another notable patent is the "Manufacturing method of graphene modulated high-K oxide and metal gate MOS device." This method introduces a graphene thin film on a Ge-based substrate and utilizes fluorination treatment and ozone plasmas to enhance the properties of the device, improving the interface between the substrate and the gate dielectric layer.

Career Highlights

Xiaohu Zheng is affiliated with the Chinese Academy of Sciences, where he conducts research and development in advanced materials. His work focuses on leveraging the unique properties of graphene to create innovative solutions in electronics and materials science.

Collaborations

Zheng collaborates with esteemed colleagues, including Zengfeng Di and Miao Zhang, to further advance research in graphene applications. Their combined expertise contributes to the ongoing exploration of graphene's potential in various technological fields.

Conclusion

Xiaohu Zheng's innovative work in graphene technology showcases his commitment to advancing materials science. His patents reflect a deep understanding of the complexities involved in graphene applications, positioning him as a key figure in this exciting field.