New Milford, CT, United States of America

Xiaodong Yan

USPTO Granted Patents = 1 

Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 20(Granted Patents)


Company Filing History:


Years Active: 2015

where 'Filed Patents' based on already Granted Patents

1 patent (USPTO):

Title: Innovations by Xiaodong Yan: A Pioneer in Copper Cleaning Solutions

Introduction

Xiaodong Yan, an innovative inventor based in New Milford, Connecticut, has made significant contributions to the field of microelectronics. With a focus on enhancing the cleaning processes used in semiconductor manufacturing, Yan holds a patent that embodies his commitment to advancing technology in this essential industry.

Latest Patents

Yan's notable patent is for "Copper cleaning and protection formulations". This invention presents a cleaning composition and a process designed specifically for the effective removal of post-chemical mechanical polishing (CMP) residue and contaminants from microelectronic devices. The formulations he developed include novel corrosion inhibitors, ensuring that the cleaning process does not compromise the integrity of the low-k dielectric material or the copper interconnect material within the devices. This innovative approach achieves highly efficient cleaning results, which are critical for the performance and longevity of microelectronic components.

Career Highlights

Xiaodong Yan is currently employed at Advanced Technology Materials, Inc., a company known for its focus on providing advanced materials and solutions for the semiconductor industry. His work at this organization underscores his dedication to fostering improvements in technology that address industry challenges, particularly in microelectronics.

Collaborations

Throughout his career, Yan has collaborated with esteemed colleagues, including Jeffrey A Barnes and Brian L Benac. These partnerships have likely enhanced the development and refinement of his inventions, contributing to the innovative spirit within the field of microelectronics.

Conclusion

Xiaodong Yan’s invention of copper cleaning and protection formulations showcases his innovative mind and dedication to solving complex problems in the semiconductor landscape. His work continues to play a vital role in the improvements of cleaning processes for microelectronic devices, ensuring they operate at peak performance without compromising their structural integrity. As the industry evolves, inventors like Yan remain crucial to paving the way for future advancements.

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