Atlanta, GA, United States of America

Xiaodong Hu

This inventor holds 2 USPTO granted patents. Top assignee: Shipley Company LLC. Active years: 2005-2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Xiaodong Hu. Retrieved from https://idiyas.com/inventor/xiaodong-hu-jktv3fpt

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0

Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2005-2006

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2 patents (USPTO):Explore Patents

Title: Innovations by Xiaodong Hu

Introduction

Xiaodong Hu is an accomplished inventor based in Atlanta, GA. He has made significant contributions to the field of resistive materials, holding a total of 2 patents. His work focuses on the development of electrically resistive materials that incorporate platinum along with iridium and ruthenium.

Latest Patents

Xiaodong Hu's latest patents include innovative formulations of resistive materials. One patent discloses an electrically resistive material that includes platinum and between 5 and 70 molar percent of iridium, ruthenium, or mixtures thereof, calculated based on platinum as 100%. Another patent presents a similar formulation, emphasizing the versatility and potential applications of these materials in various industries.

Career Highlights

Xiaodong Hu is currently employed at Shipley Company LLC, where he continues to advance his research and development efforts. His expertise in resistive materials has positioned him as a key player in the field, contributing to the company's innovative projects.

Collaborations

Xiaodong has collaborated with notable colleagues, including Jud Ready and Trifon Tomov. Their combined efforts have fostered a creative environment that encourages the exploration of new ideas and technologies.

Conclusion

Xiaodong Hu's contributions to the field of resistive materials highlight his innovative spirit and dedication to advancing technology. His patents reflect a commitment to excellence and a vision for the future of materials science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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