Beijing, China

Xiaodong Fan

USPTO Granted Patents = 1 

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2006

Loading Chart...
1 patent (USPTO):

Title: An Insight into the Innovations of Inventor Xiaodong Fan

Introduction: Xiaodong Fan is an accomplished inventor based in Beijing, China, known for his innovative contributions to the field of photolithography. With a unique approach to integrated circuit manufacturing, he has developed technology that enhances the efficiency and accuracy of the photolithographic process.

Latest Patents: Xiaodong Fan holds a patent for a "Photolithography system having multiple adjustable light sources." This invention pertains to a sophisticated device designed for the photolithography of integrated circuits. It comprises a base plate, a precision working table, and an optical head array. The optical head array features a line-array photosource scan-imaging device that employs the optical probe technique. Notably, the invention incorporates a line-array photosource made up of several adjacent micro-photosources, capable of both micro-laser implementations and line-array photosource devices. The methodology introduced allows for encoding based on the scan width of the line-array photosource, providing a robust solution for alignment during the integrated circuit photolithographic process.

Career Highlights: Xiaodong Fan is affiliated with Tsinghua University, an institution renowned for its contributions to science and technology. His role there has enabled him to pursue pioneering research in the realm of photolithography, paving the way for advancements in integrated circuit fabrication.

Collaborations: In his professional journey, Xiaodong Fan has collaborated with notable colleagues, including Duanyi Xu and Guosheng Qi. Their combined expertise contributes to significant developments in the research and application of semiconductor manufacturing technologies.

Conclusion: Xiaodong Fan's inventive spirit and dedication to enhancing photolithography systems highlight his contributions to modern technology. With a patented innovation that optimizes the process of integrated circuit production, he exemplifies the impact of dedicated research and collaboration in the field of electronic engineering. His work at Tsinghua University continues to inspire advancements in the industry and serves as a testament to the transformative power of innovation.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…