Tsinghua University

Xiaodong Fan

Kun Qian

Guosheng Qi

Duanyi Xu

Peijun Jiang

The invention relates to a device for photolithography of integrated circuits, at least comprising base plate, precision working table, optical head array; the optical head array adopts a line-array photosource scan-imaging device to realize the optical probe technique, and the line-array photosource scan-imaging device comprises a line-array photosource consisting of a plurality of adjacent linearly-arranged micro-photosources and the micro-imaging system performing micro-imaging for the photosource; the line-array photosource can realized not only with a plurality of micro-lasers but also with a line-array photosource device; a novel method is disclosed that can perform encoding based upon the line-array photosource scan width; an integrated circuit photolithographic method which can align the silicon wafer not only at the beginning of photolithography but also can repeatedly align it if needed during the photolithographic process.

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Beijing, China

Xiaodong Fan