This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2012.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2012
Title: Innovations of Xiao Feng Wang: Pioneering Nano Filament Structures
Introduction: Xiao Feng Wang is a distinguished inventor based in Gyeonggi-do, South Korea. He holds a significant patent that contributes to advancements in the field of nanotechnology. His work, particularly at Samsung Electronics Co., Ltd., demonstrates his commitment to innovation and his role in shaping modern technological solutions.
Latest Patents: Wang's notable patent is titled "Nano filament structure and methods of forming the same." This invention presents a unique nano filament structure that consists of a first layer placed on a substrate, a second layer featuring a nanometer-sized gap, and a catalyst layer interposed between these layers. The highlight of this patent is the nano filament, which grows by penetrating the gap of the second layer and is in contact with the catalyst layer, showcasing a significant advancement in nano fabrication techniques.
Career Highlights: Wang has built an impressive career at Samsung Electronics Co., Ltd., recognized for its commitment to technology and innovation. His contributions, particularly in the domain of nano structures, align with the company's vision of pushing the boundaries of technology to create cutting-edge products.
Collaborations: Throughout his career, Xiao Feng Wang has had the opportunity to work alongside talented professionals, including Subramanya Mayya Kolake and In-Seok Yeo. These collaborations reflect a shared commitment to innovation and the pursuit of excellence in scientific research and development.
Conclusion: Xiao Feng Wang's work in developing nano filament structures marks a significant milestone in the field of nanotechnology. With his innovative approach and collaboration with esteemed colleagues at Samsung Electronics Co., Ltd., he continues to contribute towards advancing technology and enhancing the realm of possibilities within the industry. His journey serves as an inspiration for aspiring inventors and highlights the importance of innovation in today's fast-paced technological landscape.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
