Xianzi Dong

Title: Xianzi Dong: Innovator in Photolithography and Laser Processing

Introduction

Xianzi Dong is a prominent inventor based in Beijing, China. He has made significant contributions to the fields of photolithography and laser processing, holding a total of 3 patents. His innovative work focuses on advanced systems that enhance precision in micro and nano fabrication.

Latest Patents

Xianzi Dong's latest patents include a "Maskless Photolithographic System in Cooperative Working Mode for Cross-Scale Structure." This system features a laser point-by-point scanning exposure unit and a plane-projection exposure unit, allowing for precise pattern exposure based on varying precision requirements. The system effectively combines different exposure methods to achieve high-quality results.

Another notable patent is the "Laser Micro/Nano Processing System and Method." This invention utilizes two laser beams of different wavelengths to achieve micro and nano structures with higher processing resolution. The system is designed to focus both laser beams at the same focal point, enabling advanced processing techniques that utilize lower average power.

Career Highlights

Xianzi Dong is affiliated with the Chinese Academy of Sciences, where he continues to push the boundaries of innovation in his field. His work has garnered attention for its potential applications in various industries, including electronics and materials science.

Collaborations

Xianzi has collaborated with notable colleagues such as Xuanming Duan and Shu Kai Chen, contributing to a dynamic research environment that fosters innovation and development.

Conclusion

Xianzi Dong's contributions to photolithography and laser processing exemplify the spirit of innovation. His patents reflect a commitment to advancing technology and improving precision in manufacturing processes.