Company Filing History:
Years Active: 2017
Title: Xiantao Han: Innovator in Chemically-Amplified Photoresists
Introduction
Xiantao Han is a prominent inventor based in Beijing, China. He has made significant contributions to the field of photoresist technology, particularly through his innovative work on negative chemically-amplified photoresists. His expertise and inventions have positioned him as a key figure in the microelectronics industry.
Latest Patents
Xiantao Han holds a patent for a novel negative chemically-amplified photoresist and its imaging method. This invention includes a unique formulation comprising phenol resin, a photo-acid generator, a cross-linking agent, an alkaline additive, a sensitizing agent, and a photoresist solvent. The photo-acid generator is designed to produce an acid of specific strength when exposed to light. The cross-linking agent facilitates a condensation reaction with phenolic hydroxyl groups or ortho-/para-hydroxymethyl functional groups. The imaging method involves several steps, including coating, baking, exposure, and developing. This innovative photoresist enhances resolution and photospeed, making it suitable for high-end applications in integrated circuits, flat panel displays, and LED chips. Xiantao Han has 1 patent to his name.
Career Highlights
Xiantao Han is currently employed at Kempur Microelectronics, Inc., where he continues to advance his research and development efforts in the field of microelectronics. His work has garnered attention for its potential to improve manufacturing processes and product quality in the electronics industry.
Collaborations
Xiantao Han collaborates with talented colleagues, including Jia Sun and Xin Chen, who contribute to his research initiatives and projects. Their combined expertise fosters a productive environment for innovation and development.
Conclusion
Xiantao Han's contributions to the field of photoresist technology exemplify the impact of innovative thinking in microelectronics. His patented work on negative chemically-amplified photoresists showcases his commitment to advancing technology and improving manufacturing processes.