Guiyang, China

Xiangyue Dai

This inventor holds 1 USPTO granted patent and 1 published patent application. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Xiangyue Dai. Retrieved from https://idiyas.com/inventor/xiangyue-dai

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations of Xiangyue Dai in Arc Protection Garments.

Introduction

Xiangyue Dai is a notable inventor based in Guiyang, China. He has made significant contributions to the field of safety apparel, particularly in the development of arc protection garments. His innovative designs aim to enhance safety for individuals working in high-risk environments.

Latest Patents

One of Xiangyue Dai's key inventions is an arc protection garment. This garment is designed to provide effective protection against electrical arcs. The arc protection garment comprises an arc protection garment body, a detachable fixed component, a protective plate, and a limit component. The design allows for quick removal of the protective plate without needing to turn over an injured person, facilitating emergency handling.

Career Highlights

Xiangyue Dai holds 1 patent related to his work in arc protection garments. His focus on safety and innovation has positioned him as a valuable contributor to the field. His work reflects a commitment to improving safety standards in hazardous work environments.

Collaborations

Xiangyue Dai has collaborated with notable colleagues, including Jialong Wu and Xi Fang. Their combined expertise has contributed to the advancement of safety technologies in the industry.

Conclusion

Xiangyue Dai's innovative work in arc protection garments showcases his dedication to enhancing safety in high-risk environments. His contributions are vital for the ongoing development of protective apparel.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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