Shenzhen, China

Xiangwen Lin

This inventor holds 1 USPTO granted patent. Top assignee: Shenzhen Oneleaf Technology Co., Ltd.. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Xiangwen Lin. Retrieved from https://idiyas.com/inventor/xiangwen-lin-cjg3ojbr

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 27(Granted Patents)


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Xiangwen Lin: Innovator in Night Vision Technology

Introduction

Xiangwen Lin is a prominent inventor based in Shenzhen, China. He is known for his innovative contributions to the field of optical technology, particularly in night vision devices. His work has significantly impacted the way we perceive and utilize night vision technology.

Latest Patents

Xiangwen Lin holds a patent for a night vision binocular. This invention showcases his expertise in developing advanced optical systems that enhance visibility in low-light conditions. The patent reflects his commitment to innovation and improving user experience in night vision applications. He has 1 patent to his name.

Career Highlights

Lin is currently employed at Shenzhen Oneleaf Technology Co., Ltd. His role at the company allows him to work on cutting-edge technologies and collaborate with other talented professionals in the field. His contributions have been instrumental in advancing the company's product offerings.

Collaborations

Xiangwen Lin has worked alongside notable colleagues, including Gong Huang and Peng Wang. Their collaborative efforts have fostered a creative environment that encourages innovation and the development of new technologies.

Conclusion

Xiangwen Lin is a key figure in the realm of night vision technology, with a focus on enhancing optical devices. His patent for night vision binoculars exemplifies his innovative spirit and dedication to improving technology. His work continues to influence the industry and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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