Xiangpeng Bu

Title: Xiangpeng Bu: Innovator in Nanometer Displacement Measurement

Introduction

Xiangpeng Bu is a prominent inventor based in Beijing, China. He has made significant contributions to the field of measurement technology, particularly in the area of nanometer displacement. His innovative work has led to the development of advanced measurement systems that enhance precision and accuracy.

Latest Patents

Xiangpeng Bu holds a patent for a "Composite measurement system for measuring nanometer displacement." This system includes a light source, a polarization beam splitting prism, a first phase change module, a second phase change module, a first right-angle prism, a second right-angle prism, a non-polarization beam splitting prism, a scalar interference light collection module, a vector interference light collection module, and a displacement calculation module. The system is designed to collect and analyze light intensity changes to accurately measure the displacement of objects at the nanometer scale.

Career Highlights

Xiangpeng Bu is affiliated with the National Institute of Metrology, China, where he has been instrumental in advancing measurement technologies. His expertise in optical measurement systems has positioned him as a key figure in the field.

Collaborations

Xiangpeng has collaborated with notable colleagues, including Yushu Shi and Shu Zhang, contributing to various projects that aim to enhance measurement accuracy and technology.

Conclusion

Xiangpeng Bu's innovative contributions to nanometer displacement measurement exemplify the importance of precision in scientific research and technology. His work continues to influence advancements in measurement systems, showcasing the vital role of inventors in driving innovation.