San Jose, CA, United States of America

Xiang Chang


Average Co-Inventor Count = 14.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):

Title: Innovator Profile: Xiang Chang from San Jose, CA

Introduction

Xiang Chang is an accomplished inventor based in San Jose, California. He has made significant contributions to the field of semiconductor manufacturing with his innovative methods aimed at enhancing metal gapfill processes. With a focus on reducing resistivity in metal layers, Xiang’s work has implications for improving the efficiency and reliability of electronic devices.

Latest Patents

Xiang Chang holds a patent titled "Methods for forming metal gapfill with low resistivity." This patent outlines a process that involves depositing a conformal layer within an opening of a substrate's feature, with a thickness of approximately 10 microns or less. Following this, a non-conformal metal layer is deposited using an anisotropic deposition process, achieving a thickness of approximately 30 microns or greater at the bottom of the opening and on the field. Finally, a metal gapfill material is added to completely fill the opening without any voids, ensuring optimal conductivity.

Career Highlights

Xiang is employed at Applied Materials, Inc., a leading company in the semiconductor equipment and materials industry. His role involves pushing the boundaries of current technologies to develop solutions that meet the demands of modern electronic devices. The success of his patented methods showcases his dedication to innovation and the advancement of manufacturing processes.

Collaborations

Throughout his career, Xiang has collaborated with fellow colleagues Yi Xu and Yu Lei. Together, they share insights and expertise that foster an environment of creativity and technical excellence, enhancing the potential for innovative breakthroughs at Applied Materials.

Conclusion

Xiang Chang’s contributions to the field of semiconductor manufacturing exemplify the impact of innovation in technology. His patented methods for reducing the resistivity of metal gapfill continue to influence the industry, and his collaborative spirit at Applied Materials further underscores the importance of teamwork in fostering advancements in engineering and manufacturing.

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