Xiancan Deng

Title: Innovations of Xiancan Deng in Semiconductor Technology

Introduction

Xiancan Deng is a prominent inventor based in Santa Clara, CA (US). He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on methods that enhance the integrity and efficiency of semiconductor etching processes.

Latest Patents

Deng's latest patents include innovative methods for heating semiconductor substrates and controlling patterned etching in copper features. His first patent addresses a method of heating a semiconductor substrate, which ensures that copper can be pattern etched with the desired feature dimensions and integrity. This method is particularly crucial for features smaller than 0.5 µm, where even minimal exposure to corrosive agents can compromise the structure. The patent outlines several mechanisms to protect the copper feature integrity during the etching process.

The second patent focuses on controlling patterned etching in semiconductor features. It emphasizes the application of hydrogen to the etched copper surface to prevent reactive species from penetrating and damaging the copper interior. This method utilizes hydrogen chloride (HCl) and/or hydrogen bromide (HBr) as the primary reactive species, ensuring that the copper features maintain their integrity during the etching process.

Career Highlights

Xiancan Deng is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work has been instrumental in advancing etching technologies that are critical for modern semiconductor manufacturing.

Collaborations

Deng collaborates with notable colleagues such as Yan Ye and Allen Richard Zhao, contributing to a dynamic research environment that fosters innovation in semiconductor technology.

Conclusion

Xiancan Deng's contributions to semiconductor technology through his patents and work at Applied Materials, Inc. highlight his role as a key innovator in the field. His methods for enhancing etching processes are vital for the advancement of semiconductor manufacturing.