This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2000.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2000
Title: Xian-Can Deng: Innovator in Semiconductor Technology
Introduction
Xian-Can Deng is a prominent inventor based in Hangzhou, China. He has made significant contributions to the field of semiconductor technology, particularly in the area of post-etch treatments for plasma-etched surfaces. His innovative work has led to advancements that enhance the reliability and performance of semiconductor devices.
Latest Patents
Xian-Can Deng holds a patent for a method titled "Post-etch treatment of plasma-etched feature surfaces to prevent corrosion." This patent addresses the challenges associated with surface corrosion of etched metal features in semiconductor devices. The treatment significantly reduces or eliminates corrosion by preventing moisture formation on the etched surfaces. It employs a high vacuum, an inert purge gas, and elevated substrate temperatures to achieve optimal results. The process utilizes plasma to expose the etched features to active hydrogen, facilitating reactions that remove harmful residues while maintaining the integrity of the surface.
Career Highlights
Xian-Can Deng is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work at Applied Materials has positioned him as a key player in developing innovative solutions that improve semiconductor manufacturing processes. His expertise and dedication to advancing technology have earned him recognition in his field.
Collaborations
Xian-Can Deng has collaborated with notable colleagues, including Yan Ye and Xiaoye Zhao. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas within the semiconductor community.
Conclusion
Xian-Can Deng's contributions to semiconductor technology through his innovative patent and work at Applied Materials, Inc. highlight his role as a significant inventor in the industry. His efforts to improve post-etch treatments are paving the way for enhanced semiconductor device performance and reliability.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile