Xiadong Da

Title: Xiadong Da: Innovator in Electron Beam Processing

Introduction

Xiadong Da is a notable inventor based in Portland, OR (US). He has made significant contributions to the field of electron beam processing, particularly in the area of lithography mask repair. His innovative approach addresses critical challenges faced in the industry.

Latest Patents

Xiadong Da holds 1 patent for his invention titled "Electron beam processing." This patent describes a method and apparatus for utilizing an electron beam activated gas to etch or deposit material. The invention is particularly effective for repairing defects in lithography masks. By employing an electron beam instead of an ion beam, it eliminates various issues associated with ion beam mask repair, such as staining and riverbedding. The method allows for endpoint detection to be less critical, as the electron beam and gas do not etch the substrate. In one embodiment, xenon difluoride gas is activated by the electron beam to etch films made of tungsten, tantalum nitride, or molybdenum silicide on transmission or reflection masks. To prevent spontaneous etching at processed sites where the passivation layer has been removed, these sites can be re-passivated before further processing.

Career Highlights

Xiadong Da is currently employed at Fei Company, where he continues to develop and refine his innovative technologies. His work has had a significant impact on the field of electron beam processing, contributing to advancements in lithography and material deposition techniques.

Collaborations

Xiadong has collaborated with notable colleagues, including Christian R Musil and J David Casey, Jr. Their combined expertise has further enhanced the development of innovative solutions in their field.

Conclusion

Xiadong Da's contributions to electron beam processing exemplify the importance of innovation in technology. His work not only addresses existing challenges but also paves the way for future advancements in lithography mask repair.