Beijing, China

Xia Liu

USPTO Granted Patents = 1 

 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Innovations of Xia Liu in Precision Measurement

Introduction

Xia Liu is a notable inventor based in Beijing, China. He has made significant contributions to the field of precision measurement and metrology. His innovative work has led to the development of a unique method that enhances the accuracy of impedance measurements.

Latest Patents

Xia Liu holds a patent for a method titled "Method for achieving terminal-pair definition of four-terminal-pair impedance and application thereof." This invention provides a solution for achieving terminal-pair definition of four-terminal-pair (4TP) impedance. The method involves connecting a current output terminal of a two-stage follower to a high current terminal of impedance through a coaxial line. Additionally, a voltage output terminal of the two-stage follower is connected to a high voltage terminal of the impedance through the same coaxial line. This configuration ensures that the current of the high voltage terminal is zero, allowing core wire currents and outer wire currents of the high current terminal to be equal and reverse. The invention accelerates the balancing speed of the 4TP impedance bridge, enabling accurate and fast comparative measurements with high precision of the 4TP AC impedance.

Career Highlights

Throughout his career, Xia Liu has worked with esteemed organizations such as the National Institute of Metrology, China, and Jing-jin Electric Technologies Co., Ltd. His experience in these institutions has contributed to his expertise in precision measurement technologies.

Collaborations

Xia Liu has collaborated with notable colleagues, including Yan Yang and Lu Huang. These partnerships have fostered innovation and advancements in their respective fields.

Conclusion

Xia Liu's contributions to precision measurement through his innovative patent demonstrate his commitment to advancing technology in metrology. His work continues to influence the field and inspire future innovations.

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