Company Filing History:
Years Active: 2010-2018
Title: The Innovative Mind of Xavier Multone
Introduction
Xavier Multone is a notable inventor based in Monthey, Switzerland. He has made significant contributions to the field of beam processing technology, holding 2 patents that showcase his innovative approach to material etching.
Latest Patents
One of his latest patents is focused on beam-induced etching. This method and apparatus utilize a beam-activated gas to etch materials effectively. The invention is particularly advantageous for electron beam-induced etching of chromium materials on lithography masks. In one embodiment, a polar compound, such as ClNO gas, is activated by the electron beam to selectively etch chromium material on a quartz substrate. By employing an electron beam instead of an ion beam, many issues associated with ion beam mask repair, such as staining and riverbedding, are resolved. Additionally, endpoint detection is not critical since the electron beam and gas do not significantly etch the substrate.
Career Highlights
Throughout his career, Xavier Multone has worked with reputable organizations, including FEI Company and École Polytechnique Fédérale de Lausanne. His experience in these institutions has contributed to his expertise in the field of beam processing.
Collaborations
Xavier has collaborated with talented individuals such as Tristan Bret and Patrik Hoffmann, further enhancing his innovative projects and research.
Conclusion
Xavier Multone's contributions to beam processing technology and his innovative patents reflect his dedication to advancing the field. His work continues to influence the industry and inspire future innovations.