Wuwen Yi

Title: Wuwen Yi: Innovator in Sputtering Target Technology

Introduction

Wuwen Yi is a notable inventor based in Veradale, WA (US). He has made significant contributions to the field of materials science, particularly in the development of advanced sputtering targets. With a total of 2 patents to his name, his work has implications for various applications in the semiconductor and electronics industries.

Latest Patents

Wuwen Yi's latest patents include innovations in copper sputtering targets and methods of forming these targets. The first patent focuses on a copper-comprising sputtering target that is either monolithic or bonded, containing at least 99.99% copper by weight. This target features an average grain size ranging from 1 micron to 50 microns, a yield strength of at least 15 ksi, and a Brinell hardness greater than 40. Additionally, the invention encompasses copper alloy sputtering targets with specific alloying elements and grain size uniformity. The second patent involves a non-magnetic physical vapor deposition target, which includes a combination of elements such as Co, Ni, Ta, Ti, Pt, Mo, and W, along with silicon. This target is designed to have a single phase and minimal additional phases.

Career Highlights

Wuwen Yi is currently employed at Honeywell International Inc., where he continues to advance his research and development efforts. His work is pivotal in enhancing the performance and reliability of sputtering targets used in various high-tech applications.

Collaborations

Wuwen Yi collaborates with esteemed colleagues such as Chi Tse Wu and Vladimir M Segal. Their combined expertise contributes to the innovative projects undertaken at Honeywell International Inc.

Conclusion

Wuwen Yi's contributions to sputtering target technology exemplify the importance of innovation in materials science. His patents reflect a commitment to advancing the capabilities of materials used in the semiconductor industry.