Nuenen, Netherlands

Wouter Harry Jacinth Rensen

This inventor holds 1 USPTO granted patent. Top assignee: Salvia Bioelectronics B.v.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wouter Harry Jacinth Rensen. Retrieved from https://idiyas.com/inventor/wouter-harry-jacinth-rensen-fs31h7uq

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Wouter Harry Jacinth Rensen: Medical Device Placement Innovation

Introduction

Wouter Harry Jacinth Rensen is an inventor based in Nuenen, the Netherlands. His patent work addresses the planning and placement of medical devices, and he is associated with Salvia Bioelectronics B.V.

Latest Patents

Rensen is named on one patent, titled “Template for Planning a Placement of One or More Portions of a Medical Device.” The invention describes a medical template with portions corresponding to parts of a device. Its curved face is designed to sit adjacent to curved skin, while mechanically resistive regions can help control the template’s shape. Offset alignment marks can also indicate positions corresponding to the implantation depth of device portions. These features are intended to support accurate planning of medical device placement.

Career Highlights

Rensen’s documented patent contribution focuses on a practical challenge in medical device implantation: aligning device components with the contours of the body and their intended placement depth. His work is associated with Salvia Bioelectronics B.V.

Collaborations

Rensen’s named coworkers include Daniel Willem Elisabeth Schobben and Tom Delaey. The patent reflects collaborative innovation in medical device planning and placement.

Conclusion

Wouter Harry Jacinth Rensen’s patent describes a curved medical template designed to help plan the placement of device portions in relation to the skin and implantation depth.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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