Company Filing History:
Years Active: 2015-2017
Title: Wooyoung Shim: Innovator in Lithography Technologies
Introduction
Wooyoung Shim is a prominent inventor based in Skokie, IL (US). He has made significant contributions to the field of lithography, holding a total of 2 patents. His innovative work focuses on advanced methods and systems that enhance the precision and efficiency of patterning processes.
Latest Patents
Among his latest patents are "Heat actuated and projected lithography systems and methods" and "Silicon pen nanolithography." The first patent describes a method of patterning that involves dividing an image into frame sections and determining a tip pattern for each section. This method allows for the selective irradiation of tips in a tip array to pattern a substrate accurately. The second patent outlines methods of lithography using a tip array with pens that can deposit a patterning composition onto a substrate. This innovative approach enables easy leveling of tips and optical monitoring of the process.
Career Highlights
Wooyoung Shim is affiliated with Northwestern University, where he continues to advance research in lithography technologies. His work has garnered attention for its potential applications in various fields, including electronics and materials science.
Collaborations
He has collaborated with notable researchers such as Chad A. Mirkin and Xing Liao, contributing to the advancement of lithography techniques and their applications.
Conclusion
Wooyoung Shim's contributions to lithography through his innovative patents and collaborations highlight his role as a key figure in advancing this technology. His work continues to influence the field and pave the way for future innovations.