Woosung Park

Title: Woosung Park - Innovator in Semiconductor Technology

Introduction

Woosung Park is an inventor based in Suwon-si, South Korea. He is known for his contributions to semiconductor technology. Although he currently holds no granted patents, his work in the field is noteworthy.

Latest Patent Applications

Woosung Park's latest patent application is for a semiconductor device. This innovative device includes an active region that extends in a first direction and incorporates first conductivity-type impurities. It features an ion doped region that also extends in the first direction within the active region, containing second conductivity-type impurities. The design includes a gate structure that extends in a second direction, intersecting the first direction, and is positioned on the active region. Additionally, there is a source/drain region located on the active region on at least one side of the gate structure. The device is surrounded by a device isolation layer, with an interlayer insulating layer covering the gate structure and the source/drain region. A vertical power structure extends in a third direction, which is perpendicular to the first and second directions, passing through both the device isolation layer and the interlayer insulating layer. Finally, a bottom wiring connects to the vertical power structure and contacts the bottom surface of the active region.

Conclusion

Woosung Park's work in semiconductor technology showcases his innovative approach to device design. His latest patent application reflects his commitment to advancing the field.