Suwon, South Korea

Woong Sun Lim

This inventor holds 1 USPTO granted patent. Top assignee: Sungkyunkwan University. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Woong Sun Lim. Retrieved from https://idiyas.com/inventor/woong-sun-lim

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Woong Sun Lim: Innovator in Graphene Technology

Introduction

Woong Sun Lim is a prominent inventor based in Suwon, South Korea. He has made significant contributions to the field of materials science, particularly in the area of graphene technology. His innovative work has led to the development of a unique method for etching atomic layers of graphene.

Latest Patents

Lim holds a patent for a "Method for etching atomic layer of graphene." This patent describes an atomic layer etching method that involves adsorbing reactive radicals onto the surface of graphene and subsequently irradiating an energy source to the graphene where the reactive radicals are adsorbed. This technique has the potential to enhance the precision and efficiency of graphene applications in various industries.

Career Highlights

Woong Sun Lim is affiliated with Sungkyunkwan University, where he engages in research and development in advanced materials. His academic background and research focus have positioned him as a key figure in the exploration of graphene's capabilities and applications.

Collaborations

Lim has collaborated with notable colleagues, including Jong Sik Oh and Kyung Seok Min. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas in the field of graphene research.

Conclusion

Woong Sun Lim's contributions to graphene technology exemplify the impact of innovative thinking in materials science. His patent and ongoing research continue to pave the way for advancements in this exciting field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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