Incheon, South Korea

Woong Seob Shin

This inventor holds 1 USPTO granted patent. Top assignee: Microsoft Technology Licensing, LLC. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Woong Seob Shin. Retrieved from https://idiyas.com/inventor/woong-seob-shin

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2023

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Woong Seob Shin: Innovator in Solvent-Free Textile Coating

Introduction

Woong Seob Shin is a notable inventor based in Incheon, South Korea. He has made significant contributions to the field of textile technology, particularly with his innovative approach to solvent-free coatings.

Latest Patents

Woong Seob Shin holds a patent for a solvent-free textile coating. This invention relates to the development of solvent-free films and textiles that can effectively receive these films. His work in this area is crucial for advancing sustainable practices in textile manufacturing.

Career Highlights

Currently, Woong Seob Shin is associated with Microsoft Technology Licensing, LLC. His role at this prominent company allows him to leverage his expertise in technology and innovation.

Collaborations

Throughout his career, Woong Seob Shin has collaborated with talented individuals such as James Alec Ishihara and Kyra Gould. These partnerships have contributed to the advancement of his projects and innovations.

Conclusion

Woong Seob Shin is a pioneering inventor whose work in solvent-free textile coatings exemplifies innovation in sustainable technology. His contributions are paving the way for a greener future in the textile industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…