Woong-Gi Kim

Title: Woong-Gi Kim: Innovator in Semiconductor Technology

Introduction

Woong-Gi Kim is a prominent inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approach to device design and fabrication.

Latest Patents

His latest patents include an "Elevated source drain semiconductor device with L-shaped spacers and fabricating method thereof." This semiconductor device features a gate on a substrate, a gate insulating layer along the sidewall and bottom surface of the gate, and an L-shaped spacer structure on both sidewalls of the gate. The design extends the distance between the gate and source/drain regions to either side of the gate. Another notable patent is a "semiconductor device" that incorporates a pattern structure for performance improvement. This device includes first and second active regions spaced apart with an isolation layer in between, along with a first normal gate and dummy gates that enhance the overall functionality of the semiconductor.

Career Highlights

Woong-Gi Kim is currently employed at Samsung Electronics Co., Ltd., a leading company in the electronics and semiconductor industry. His work at Samsung has allowed him to push the boundaries of semiconductor technology and contribute to advancements in the field.

Collaborations

He has collaborated with notable coworkers such as Min-Yeop Park and Leonelli Daniele, further enriching his experience and expertise in semiconductor innovations.

Conclusion

Woong-Gi Kim's contributions to semiconductor technology through his patents and work at Samsung Electronics Co., Ltd. highlight his role as an influential inventor in the industry. His innovative designs continue to shape the future of semiconductor devices.