Anyang, South Korea

Woon-hee Park

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Woon-hee Park. Retrieved from https://idiyas.com/inventor/woon-hee-park

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Woon-hee Park: Innovator in Audio Technology

Introduction

Woon-hee Park is a notable inventor based in Anyang, South Korea. He has made significant contributions to the field of audio technology, particularly through his innovative patent.

Latest Patents

Woon-hee Park holds a patent for an "Audio apparatus and control method therefor." This audio apparatus features a vibration part that provides audio through vibration. It also includes a sensing part that detects the material and thickness of the object to which the audio apparatus is attached. Additionally, the device has a pressure regulation part that adjusts the pressure applied to the object by the vibration part. A processor controls this pressure regulation based on the sensed material and thickness of the object.

Career Highlights

Woon-hee Park is currently employed at Samsung Electronics Co., Ltd., a leading company in technology and innovation. His work at Samsung has allowed him to explore and develop advanced audio solutions that enhance user experience.

Collaborations

Woon-hee Park has collaborated with talented coworkers, including Dong-jae Lee and Jae-heung Park. Their teamwork has contributed to the successful development of innovative audio technologies.

Conclusion

Woon-hee Park is a distinguished inventor whose work in audio technology has led to valuable advancements. His patent reflects his commitment to improving audio experiences through innovative solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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