This inventor holds 2 USPTO granted patents. Top assignee: Novellus Systems Incorporated. Active years: 2012-2015.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2012-2015
Title: Woody Chung: Innovator in Plasma Technology
Introduction
Woody Chung is a notable inventor based in Burlingame, CA (US). He has made significant contributions to the field of plasma technology, holding a total of 2 patents. His work focuses on enhancing plasma generator systems and methods for performing plasma stripping processes.
Latest Patents
Chung's latest patents include innovative designs for gas flow distribution receptacles and plasma generator systems. One of his notable inventions involves a gas flow distribution receptacle that features a rounded section with an inner surface defining a reception cavity. This receptacle has an outer surface forming an enclosed end, with a centerpoint on the outer surface that has a longitudinal axis extending through the reception cavity. The design includes first and second rings of openings that provide flow communication with the plasma chamber. The second ring of openings is strategically placed between the first ring and the centerpoint, with each opening extending at a specific angle relative to the longitudinal axis. This design ensures optimal gas flow and efficiency in plasma stripping processes.
Career Highlights
Woody Chung has been instrumental in advancing plasma technology through his work at Novellus Systems Incorporated. His innovative approach and technical expertise have positioned him as a key player in the industry.
Collaborations
Chung has collaborated with talented individuals such as Huatan Qiu and Anirban Guha, contributing to the development of cutting-edge technologies in plasma systems.
Conclusion
Woody Chung's contributions to plasma technology through his patents and collaborations highlight his role as an influential inventor in the field. His work continues to pave the way for advancements in plasma generator systems and processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
