Company Filing History:
Years Active: 1995
Title: Woo-sung Sung: Innovator in Photoresist Technology
Introduction
Woo-sung Sung is a notable inventor based in Suwon, South Korea. He has made significant contributions to the field of photoresist technology, particularly in the development of methods for forming mask patterns. His innovative approach simplifies existing processes, making them more efficient and effective.
Latest Patents
Woo-sung Sung holds 1 patent for a method titled "Method for forming a pattern by silylation." This patent discloses a technique for forming a mask pattern using a multi-layer photoresist film process. The method involves the use of a silylated photoresist film, which simplifies the processing compared to known methods. The process begins with the formation of a first photoresist layer on a substrate, followed by silylation of part of the surface. A second photoresist layer is then applied, exposed, and developed to create a second photoresist pattern. The silylation layer is etched back using this pattern, leading to the formation of a silylation pattern that is oxidized. Finally, the first photoresist layer is etched using the oxidized silylation pattern, resulting in a first photoresist pattern. This innovative approach maintains a resolution-increasing effect without the need for an intermediate oxide film, thereby simplifying the process and reducing undesired polymer generation.
Career Highlights
Woo-sung Sung is currently employed at Samsung Electronics Co., Ltd., a leading global technology company. His work at Samsung has allowed him to focus on advancing photoresist technologies, contributing to the company's reputation for innovation in the electronics sector.
Collaborations
One of his notable collaborators is Cheol-hong Kim. Their partnership has likely fostered advancements in their shared field of expertise, enhancing the development of innovative solutions in photoresist technology.
Conclusion
Woo-sung Sung is a prominent inventor whose work in photoresist technology has led to significant advancements in the field. His patented method for forming patterns showcases his innovative approach and commitment to simplifying complex processes. His contributions continue to impact the technology landscape positively.