This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2023.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2023
Title: Innovations of Woo-in Lee in Chemical Mechanical Polishing
Introduction
Woo-in Lee is a notable inventor based in Goyang-si, South Korea. He has made significant contributions to the field of chemical mechanical polishing (CMP) technology. His innovative approach has led to the development of a unique apparatus that enhances the uniformity of polishing processes.
Latest Patents
Woo-in Lee holds a patent for a "Chemical mechanical polishing apparatus for controlling polishing uniformity." This apparatus features a polishing pad on a polishing platen, a polishing head equipped with a membrane to hold a wafer, and a polishing slurry feeding line. Additionally, it includes a retainer ring that prevents the detachment of the wafer while allowing for the feeding of polishing slurry onto the polishing pad.
Career Highlights
Woo-in Lee is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate and contribute to advancements in CMP technology. His work is pivotal in enhancing the efficiency and effectiveness of semiconductor manufacturing processes.
Collaborations
He has collaborated with notable colleagues, including In-Kwon Kim and Seung-Ho Park, who share a commitment to advancing technology in their respective fields.
Conclusion
Woo-in Lee's contributions to chemical mechanical polishing technology exemplify the impact of innovation in the semiconductor industry. His patent and ongoing work at Samsung Electronics Co., Ltd. highlight the importance of continuous improvement in manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile