Company Filing History:
Years Active: 2003
Title: Wontae Chang: Innovator in Dielectric Thin Films
Introduction
Wontae Chang is a notable inventor based in Reston, Virginia, recognized for his contributions to the field of dielectric thin films. With a total of two patents to his name, Chang has made significant advancements that enhance the performance of materials used in various applications.
Latest Patents
Chang's latest patents include innovations in strain-relieved tunable dielectric thin films and bomb annealing of thin films. The first patent focuses on tunable dielectric thin films that exhibit low dielectric losses at microwave frequencies. These films consist of a low dielectric loss substrate, a buffer layer, and a crystalline dielectric film, with barium strontium titanate being a key component. The buffer layer is crucial as it provides strain relief during annealing operations.
The second patent introduces a method for bomb annealing multicomponent films on a substrate. This process allows for annealing at higher temperatures in oxygen using a specially designed vessel made from multicomponent materials. This innovative approach prevents the loss of volatile components and roughening of the film surface, resulting in films with lower dielectric loss. Preferred materials for these thin films include ferroelectric materials, although the method is versatile enough for other materials as well.
Career Highlights
Throughout his career, Wontae Chang has worked with prominent organizations, including Paratek Microwave Incorporated and the United States Navy. His work has significantly impacted the development of advanced materials in the microwave frequency domain.
Collaborations
Chang has collaborated with esteemed colleagues such as James S. Horwitz and Douglas B. Chrisey, contributing to the advancement of technology in his field.
Conclusion
Wontae Chang's innovative work in dielectric thin films and annealing processes showcases his expertise and commitment to advancing material science. His patents reflect a deep understanding of the complexities involved in creating high-performance materials.
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