Suwon, South Korea

Wonjun Na

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Samsung Electro-Mechanics. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wonjun Na. Retrieved from https://idiyas.com/inventor/wonjun-na

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Wonjun Na: Multilayered Capacitor Inventor

Introduction

Wonjun Na is an inventor based in Suwon, South Korea. His patent work includes an invention concerning the design of multilayered capacitors. The supplied information lists 1 patent and identifies Samsung Electro-Mechanics as his company.

Latest Patents

Na is named on the patent “Multilayered Capacitor Including Internal Electrodes Having Lead Portions.” The invention describes a capacitor body containing first and second internal electrodes separated by a dielectric layer, with external electrodes at opposite ends of the body. Each internal electrode has a capacitance-forming portion and multiple lead portions that connect to its corresponding external electrode. A distinguishing feature is that one of the first electrode’s lead portions is thinner than its capacitance-forming portion, measured in the direction of the capacitor’s layers.

Career Highlights

The available information associates Na with Samsung Electro-Mechanics and identifies his work on multilayered capacitor technology. The patent focuses on the structure of internal electrodes and their lead portions.

Collaborations

Byeonggyu Park and Yunsung Kang are listed as Na’s coworkers. The supplied information does not specify their roles in the patent or describe the nature of their collaboration.

Conclusion

Wonjun Na’s listed patent addresses a multilayered capacitor design with differentiated electrode lead thicknesses, reflecting his documented work in electronic component innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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