Siheung, South Korea

Wonjun Jo

This inventor holds 1 USPTO granted patent. Top assignee: Daejoo Electronic Materials Co., Ltd.. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wonjun Jo. Retrieved from https://idiyas.com/inventor/wonjun-jo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Wonjun Jo

Introduction

Wonjun Jo is a notable inventor based in Siheung-si, South Korea. He has made significant contributions to the field of electronic materials, particularly through his innovative work on silver particles.

Latest Patents

Wonjun Jo holds a patent for "Silver particles and manufacturing method therefor." This invention relates to silver particles that possess a uniform particle distribution, which prevents the agglomeration of powder and significantly improves dispersibility. The silver particles are characterized by having pores within them. The manufacturing method includes a silver-complex forming step, a silver slurry preparing step, and a silver particle obtaining step, leading to the production of these advanced silver particles.

Career Highlights

Wonjun Jo is currently employed at Daejoo Electronic Materials Co., Ltd. His work at this company has allowed him to focus on developing innovative materials that enhance electronic applications. His expertise in the field has positioned him as a valuable asset to his organization.

Collaborations

Some of his coworkers include Sangwoo Kim and Chiho Yoon. Their collaborative efforts contribute to the advancement of technology in electronic materials.

Conclusion

Wonjun Jo's innovative work in the development of silver particles showcases his commitment to enhancing electronic materials. His contributions are significant in the field and continue to influence advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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