Won-Woong Chung

Title: The Innovative Contributions of Won-Woong Chung

Introduction

Won-Woong Chung is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of semiconductor technology. His work primarily focuses on methods of forming silicon layers and patterns, which are crucial for the manufacturing of semiconductor devices.

Latest Patents

Won-Woong Chung holds a patent titled "Methods of forming a silicon layer, methods of forming patterns, and methods of manufacturing semiconductor devices using the same." This patent describes a method of forming a pattern that includes several steps. It involves forming an etch target layer on a substrate, creating sacrificial patterns on the etch target layer, and using a silicon-sulfur compound to form a seed layer. The process continues with the application of a silicon precursor to create silicon-containing mask patterns, followed by etching the etch target layer using these mask patterns.

Career Highlights

Chung is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has allowed him to contribute to advancements in semiconductor manufacturing processes. His innovative methods have the potential to enhance the efficiency and effectiveness of semiconductor devices.

Collaborations

Throughout his career, Won-Woong Chung has collaborated with talented individuals such as Sun-Hye Hwang and Youn-Joung Cho. These collaborations have fostered a creative environment that encourages innovation and the development of new technologies.

Conclusion

Won-Woong Chung's contributions to semiconductor technology through his innovative patent and work at Samsung Electronics Co., Ltd. highlight his importance in the field. His methods for forming silicon layers and patterns are paving the way for advancements in semiconductor manufacturing.