Daejeon, South Korea

Won-Jung Lee

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignees: Korea Research Institute of Chemical Technology, Samyang Corporation. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Won-Jung Lee. Retrieved from https://idiyas.com/inventor/won-jung-lee-i4x16t5z

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

 

Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Innovations of Won-Jung Lee

Introduction

Won-Jung Lee is a notable inventor based in Daejeon, South Korea. He has made significant contributions to the field of photopolymerization and photoresist compositions. His work has implications in various technological applications, particularly in the realm of materials science.

Latest Patents

Won-Jung Lee holds a patent for "Fluorenyl β-oxime ester compounds, photopolymerization initiator and photoresist composition containing the same." This invention relates to a novel β-oximester fluorene derivative compound, which serves as a photopolymerization initiator and is integral to a photoresist composition. His innovative approach in this area showcases his expertise and creativity in developing new chemical compounds.

Career Highlights

Throughout his career, Won-Jung Lee has worked with prominent organizations such as Samyang Corporation and the Korea Research Institute of Chemical Technology. His experience in these institutions has allowed him to refine his skills and contribute to various research projects.

Collaborations

Some of his notable coworkers include Min-sun Lee and Chun-Rim Oh. Their collaborative efforts have likely enhanced the research and development processes in which they were involved.

Conclusion

Won-Jung Lee's contributions to the field of photopolymerization and his innovative patent reflect his dedication to advancing technology. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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